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Associate Professor, Graduate School of Engineering, Tokyo Institute of Technology |
Investigation on impact of imprity doping into nanoscale semiconductor and realization of ultrathin nascale semiconductor film |
Nanoscale semiconductors are promissing materials for next-generation information processing devices. In this project, the method to dope high-concentration impurities into nanoscale semiconductor films will be developed. In addition, characteristics of impurities in nanoscale semiconductor films, such as impurity level and carrier transport will be clarified. |
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